PhD Research Positions -Thin-film Physics of XUV Optics at University of Twente

The XUV Optics group is embedded in the MESA+ Institute (www.mesaplus.utwente.nl), which is one of the largest nanotechnology research institutes in the world, delivering competitive and successful high-quality research. The institute employs 500 people of which 275 are PhD's or PostDocs. With its unique NanoLab facilities the institute holds 1250 m2 of cleanroom space and state-of-the-art research equipment.

Job description
The aim of our research group is to develop the physics solutions for these tasks, such that new applications can be realized. These range from multi-layered optics engineered to show near-theoretical XUV reflectivity, to highly transparent, few tens of nanometer thin membranes which are robust enough to withstand high XUV power levels. The tasks include the fine-tuning of complex optical indices by altering electronic structures, the reduction of layer roughness levels to a tenth of a nanometer, the control of thin film stresses to below a GPa, and the limitation of thermally and chemically induced diffusion processes. These processes require new types of diagnostics with adequate resolution to film thickness and high sensitivity to chemical state.

The XUV Optics Group at Twente has started a new multidisciplinary research programme on these topics. We develop forefront fundamental research, relevant to high tech applications (www.utwente.nl/xuv/). The research will take place in a state-of-the-art thin film laboratory within the MESA+ Institute for Nanotechnology at the University of Twente, in collaboration with various industrial partners.

Your goal is to develop the key material science required for XUV optical systems based on nanoscale-thin films.

This may include new types of membrane structures that combine strength and transparency, using functional layers to meet requirements on mechanical strength, heat dissipation and chemical inertness.
It may also include, as an example of another project, the control of materials diffusion and segregation processes across layers and interlayers and advanced surface analysis using low energy ion scattering (LEIS) and X-ray photo-electron spectroscopy (XPS).
Or the hybrid analysis of layered textures using a combination of X-ray, electronic and optical analytical instruments, and the technique of depth-tuned fluorescence analysis to identify and localize the materials in the stack of films.

PhD Research Positions --Thin-film Physics of XUV Optics at University of Twente