Θετικές

The interaction of high-intensity ion and photon beams with thin film surfaces is a fascinating process. It involves both ion- and photon-induced physical reactions as well as photo- and plasma chemistry at the surfaces. Essential is also the control of layer growth down to sub-nanometer precision. The experimental approach will be to isolate the individual processes and to understand and control them at the atomic and molecular level, with support of analytical methods and thin film growth set-ups.