Θετικές

Ultrathin films of nanoscale thickness find a major application in multilayer reflective optics. By tuning the layer thickness, these layered stacks can reflect short-wavelength light from the ultraviolet to the soft X-ray range. When designed for the Extreme UV case, e.g. 13 nanometer, multilayers have enabled the sensational development of a high-resolution lithographic technology for the manufacture of integrated circuits. At the basis of this success was forefront fundamental research by the Foundation FOM and the MESA+ Institute.